Semiconductor foundries provide electronic companies for their micro-chip development the technology-related data
in the form of
PDK (process development kits).
These PDKs contain list of available devices i.e. transistors, their simulation SPICE models on the one hand, and physical mask layout specific data on the other.
These mask layout data in PDKs are referred to as
Design rules (DR) and describe constraints such as minimum transistor width/length, number of transistor fingers,
capacitor/resistor aspect ratio constraints, minimum metal wire width, metal-to-metal spacing, metal-fill density, the isolation trench/well spacing, diffusion area
order and spacing, poly-silicon constraints, ESD-related antenna rules, e.g.
Leading CAD companies support
iPDK, however, some mask layout CAD tools work with proprietary design rules. To enable these CAD layout editors
we need to translate the iPDK design rule to the specific, proprietary design rules.